F03800 - SEMI F38 - Test Method for Efficiency Qualification of Point-of-Use Gas Filters StdPbc-0623 SEMI P35 — Terminology for

SEMI P35 — Terminology for Microlithography Metrology

in a standardized way

file naming conventions

Peel strength of protective film from leadframe tape (see SEMI G75

cleaved wafers can be accepted as long as it does not cause a significant drop in the sensitivity (from a quarter to a half of a wafer)

F03800 - SEMI F38 - Test Method for Efficiency Qualification of Point-of-Use Gas Filters StdPbc-0623 SEMI P35 — Terminology forNOTICE: This Document was completely rewritten in 2019. The purpose of this Document is to define a comprehensive standard test sequence to qualify the particle filtration efficiency achievable using point of use (POU) gas filters. This Test Method defines an evaluation method for POU filters of various media (e. g., metallic, ceramic, and polymeric) typically used for filtering inert and process gases in semiconductor applications. POU filters are