T01000 - SEMI T10 - 二次元データマトリクス直接マーク品質を評価する試験方法 Revision:SEMI T10-0701 (Reapproved 0912) - Superseded This Test Method utilizes the

This Test Method utilizes the relationship between carbon concentration and the absorption coefficient of the infrared absorption band associated with substitutional carbon in silicon

Two representative two-wafer stacks are depicted in Figure 1 and Figure 2

and process program management

after they have been subjected to an elevated ambient temperature and cooled to room temperature (hereafter referred to as a "Heat Cycle")

This Safety Guideline may also be used by the users of such equipment and by other interested parties to assess and compare the described risks of various equipment designs or in the design and evaluation of ancillary equipment or modifications

T01000 - SEMI T10 - 二次元データマトリクス直接マーク品質を評価する試験方法 Revision:SEMI T10-0701 (Reapproved 0912) - Superseded This Test Method utilizes theglobal Traceability Technical Committee2012830global Audits and Reviews Subcommittee20129www. semiviews. org www. semi. org2001720073 , Referenced SEMI Standards None.