P04700 - SEMI P47 - ラインエッジラフネス（Line Edge Roughness）およびライン幅ラフネス（Line Width Roughness）測定の試験方法 StdPbc-0218 This Standard will cover the

This Standard will cover the quality criteria and the associated test method for impurities contained in PE bags used for polysilicon feedstock packaging

It has become increasingly important in semiconductor material and device manufacturing to describe

26-84 (first published)

equipment and testing to ensure an unified terminology for this technology

SEMI C23-0301 (technical revision)

P04700 - SEMI P47 - ラインエッジラフネス（Line Edge Roughness）およびライン幅ラフネス（Line Width Roughness）測定の試験方法 StdPbc-0218 This Standard will cover theglobal Microlithography Committee20061121global Audits and Reviews Subcommittee20072www. semi. org20073CD ROM IC Referenced SEMI Standards SEMI P19 Specification for Metrology Pattern Cells for Integrated Circuit Manufacture SEMI P35 Terminology for Microlithography Metrology SEMI P36 Guideline of Magnification Reference for Critical Dimension Measurement Scanning Electron Microscopes