Al2O3 - Sapphire Wafer 10x10x0.5 mm, A plane (11-20), 1 SP - ALA101005S1 Convection Oven (Do not use this valve

(Do not use this valve for high-pressure tube furnaces)

uniform temperature zone

Note: The door must be closed during use

5 mm thickness and 0

Working Temperature: < 50°C

Al2O3 - Sapphire Wafer 10x10x0.5 mm, A plane (11-20), 1 SP - ALA101005S1 Convection Oven (Do not use this valveFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties Wafer size: 10 mm x 10 mm x 0. 5 mm thick Orientation tolerance: + 0. 5 o. A plane orientation Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 5 A 1 side polished Package: Each wafer is packed in 1000 class clean room with