Al2O3 - Sapphire Wafer 0.25"x0.25"x0.5 mm, A plane (11-20), 1 SP Processing Tubes These highly-filled boron nitride solutions

These highly-filled boron nitride solutions are extremely lubricous and inert

Polished surface: One side EPI polished via a special CMP procedure with Ra < 5 A

Materials: MoSi2

0") produces smoother cuts and is used for cutting rare and valuable materials when waste must be held to a minimum and speed of cut is essential

Optional Quick disconnect flange with KF50 vacuum port can be easily adapted to magnetic fluid seal

Al2O3 - Sapphire Wafer 0.25"x0.25"x0.5 mm, A plane (11-20), 1 SP Processing Tubes These highly-filled boron nitride solutionsFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 0. 25" x 0. 25" x 0. 5 mm thick Orientation tolerance: + 0. 5 Deg. A plane orientation Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 8 A 1 side polished Package: Each wafer is packed in 1000 class clean room