YAG (100) 10x10x0.5mm, 1sp - YAGa101005S1 Thin-Film/Flexible Battery Wafer base: Silicon [111] N

Wafer base: Silicon [111] N type

Table-top compact design with 4 Grinding Stations

Surface of SrTiO3 substrate after Step treatment (AFM)

which is mainly used to measure the particle fineness and the dispersion degree of particle materials in various slurries

004mm)  (Inside)     (Melting Point:  ~660ºC)

YAG (100) 10x10x0.5mm, 1sp - YAGa101005S1 Thin-Film/Flexible Battery Wafer base: Silicon [111] NSingle crystal of YAG Size: 10mm x 10mm x 0. 5mm Orientation: (100) Polish: one side polished Undoped YAG (Y3Al5O12) is a new substrate and window material for both UV and IR optics. It is particularly useful for high temperature and high energy applications. YAG shows no trace absorption in 2 3micron region where glasses tend to be highly absorbent due to the strong H2O2 band. The YAG's mechanical and chemical stability is similar to sapphire, but