Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um Max. current +2 A 5 (mm3) ( 4

5   (mm3)  ( 4

MTI only sells Li chip within the USA and does not accept international order due to restrictions on hazard material exportation

Click the picture below to see the finished                     Click the video below to see how to

Optional:    Rotating heater with speed (0 - 5 RPM) is available upon request at extra cost

constant voltage charge

Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um Max. current +2 A 5 (mm3) ( 4Silicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1. 3um + 5% Si3N4 covers both sides on Corning 7980 0F fused silica ( Warning: the Si3N4 film may have stressed induced microcracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica ) Nitride Thickness: 13000 Angstroms + 5% Nitride Ref Index : 2. 30 + 0. 05 UV Grade Fused Silica (Corning 0F 7980 HPFS) Size: 100. 0