T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdTpc-Glass Wafer This Guide provides information about

This Guide provides information about the frequency and location of sampling for those parameters that are not available from online analyzers

This Guide references SEMI E78

and other methods of measuring static charge as well as the performance parameters of static-control methods

• Extension of recipe identification capability

This Safety Guideline provides guidance for the safety evaluation of load ports and wafer handling robots before integration

T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdTpc-Glass Wafer This Guide provides information aboutThis Specification provides a symbology for marking hard surface extreme ultraviolet (EUV) masks. This Specification defines the geometric and spatial relationships and content (including error checking and correcting code) of square two dimensional, machine readable, Data Matrix symbols for pattern surface marking of resist coated 6 inch EUV masks that comply with, or extrapolate from, the specifications of SEMI P37 and SEMI P38. This Specification